Product Type:
Equipment
Application:
Deposition
Product Description:
Atomic-Classic
Thermal ALD reactor for wafer sizes up to 8″ and process temperatures up to 450°C. Excellent conformality for deep trench with high aspect ratio and complex 3D nano- & micro-structures. Excellent thickness uniformity in large area substrates.
Thermal ALD Process
- Substrate Size : 4 ~ 8” Standard (Wafer)
- Thermal ALD Process
- Laminar Gas Flow (Side Gas Flow)
- Gas Delivery System : Bubbler, LDS etc.
- Low Particle Generation
- Small Volume for Process
- Available Laminated & Mixed Process
- Easy User Interface & Maintenance
- Max Temperature : 450 ℃ (@ Wafer)
- No. of Precursor Canisters : Up to 4 Sets (Standard)
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