
CMP, Wet Processing
Aquarius™ A200-sa Wafer Cleaner
Post CMP Scrubber with possible simultaneous scrubbing of 2 wafer sizes (up to 200mm), high Throughput.
INFOWet Processing solutions including spin cleaning machines, immersion wet benches, water delivery systems and post CMP scrubbers.
Post CMP Scrubber with possible simultaneous scrubbing of 2 wafer sizes (up to 200mm), high Throughput.
INFOInception Single Wafer Processing Tool from Rena. Clean, Etch, Strip & Dry - Enabling the Transition...
INFORENA's Electroplating EPM 2 is a compact electro-plating system for semiconductor device manufacturing and packaging applications.
INFORENA's Genesis Marangoni Dryer integrates drying with cleaning and rinsing, providing a one-step process for several applications.
INFOMEI’s VaporDry, Integrated IPA Drying Process displaces water from high aspect ratio features and TSV, effectively drying the...
INFOManual Loading 3-12″ single wafer spin Cleaning machine
INFOManuel Loading Automatic 4″-12″ single wafer spin cleaning system
INFORENA NA Spin Rinse Dryer offers advanced Software Controls with high Quality Hardware (control of vibrations,...
INFORevolution Immersion Wet Bench for sale. Robust rotary robots can handle carriers up to 300mm wafers...
INFOEvolution Immersion Wet Bench for sale. Full-Auto Wet Bench is an in-line, configurable, automated, modular, linear...
INFOAdvancer Immersion Wet Bench for sale. Flexible configurations that provide effective solutions to many wet processing...
INFOChemical Delivery System for sale. MEI deliver 3 different Chemical Delivery Systems: FlexChem, MultiChem and DrumChem....
INFODouble-sided PVA Scrubber for 100mm to 200mm wafers.
INFODouble-sided PVA Scrubber for 100mm to 200mm wafers.
INFODouble-sided PVA Scrubber for 100mm to 200mm wafers.
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