CMP, Wet Processing
Aquarius™ A200-sa Wafer Cleaner
Post CMP Scrubber with possible simultaneous scrubbing of 2 wafer sizes (up to 200mm), high Throughput.
INFOWet Processing solutions including spin cleaning machines, immersion wet benches, water delivery systems and post CMP scrubbers.
Post CMP Scrubber with possible simultaneous scrubbing of 2 wafer sizes (up to 200mm), high Throughput.
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Inception Single Wafer Processing Tool from Rena. Clean, Etch, Strip & Dry - Enabling the Transition...
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RENA's Electroplating EPM 2 is a compact electro-plating system for semiconductor device manufacturing and packaging applications.
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RENA's Genesis Marangoni Dryer integrates drying with cleaning and rinsing, providing a one-step process for several applications.
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MEI’s VaporDry, Integrated IPA Drying Process displaces water from high aspect ratio features and TSV, effectively drying the...
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Manual Loading 3-12″ single wafer spin Cleaning machine
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Manuel Loading Automatic 4″-12″ single wafer spin cleaning system
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RENA NA Spin Rinse Dryer offers advanced Software Controls with high Quality Hardware (control of vibrations,...
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Revolution Immersion Wet Bench for sale. Robust rotary robots can handle carriers up to 300mm wafers...
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Evolution Immersion Wet Bench for sale. Full-Auto Wet Bench is an in-line, configurable, automated, modular, linear...
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Advancer Immersion Wet Bench for sale. Flexible configurations that provide effective solutions to many wet processing...
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Chemical Delivery System for sale. MEI deliver 3 different Chemical Delivery Systems: FlexChem, MultiChem and DrumChem....
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Double-sided PVA Scrubber for 100mm to 200mm wafers.
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Double-sided PVA Scrubber for 100mm to 200mm wafers.
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Double-sided PVA Scrubber for 100mm to 200mm wafers.
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