Chemical Concentration Meter
Testproduct LM
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INFOS3 Alliance provides a selection of new and remanufactured CMP machines, customized to meet your R&D or production needs.
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Post CMP Scrubber with possible simultaneous scrubbing of 2 wafer sizes (up to 200mm), high Throughput.
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Mirra CMP Tool is a Dry In Dry Out (DIDO) CMP machine with three polishing plates...
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Dual Slurry / Cleaning Chemistry Delivery System.
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Cassette to cassette stand alone 8-12 Inch linear double side PVA scubber
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Cassette to cassette stand alone 3-6 Inch linear double side PVA scubber
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Manual Loading, automated Post CMP single chamber Scrubber for 4 to 12 inch Wafers
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Manual Loading, automated Post CMP Scrubber for 4 to 12 inch Wafers
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Intelligent CMP Equipment designed for High Versatility for 12″(300mm) wafers.
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CMP Equipment for hard and inert Wafers, high down-force, up to 2 heads, up to 200mm...
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Double-sided PVA Scrubber for 100mm to 200mm wafers.
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Double-sided PVA Scrubber for 100mm to 200mm wafers.
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Double-sided PVA Scrubber for 100mm to 200mm wafers.
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Manuel loading, one spindle one carrier automated compact Dry In Wet Out (DIWO) CMP System.
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Dry In Wet Out (DIWO) automated 2 Platen one spindle CMP System.
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